Performance Improvement of a-In-Ga-Sn-O Thin-Film Transistor with Oxygen Doping by Reactive Sputtering Method

Engineering & Materials Science

• Reactive sputtering 100%
• Thin film transistors 80%
• Doping (additives) 70%
• Tin oxides 29%
• Thin films 19%
• Magnetron sputtering 14%
• Oxide films 13%
• Threshold voltage 11%
• Annealing 10%
• Defects 7%

Chemical Compounds

• Reactive Sputtering 94%
• Flow 40%
• Density of State 34%
• Tin Oxide 33%
• Dioxygen 30%
• Drain Current 24%
• Magnetron Sputtering 18%
• Field Effect 15%
• Annealing 12%
• Compound Mobility 12%
• Voltage 11%

Physics & Astronomy

• transistors 50%
• sputtering 49%
• oxygen 38%
• thin films 32%
• performance 27%
• gallium oxides 27%
• tin oxides 20%
• indium 20%
• traps 15%
• threshold voltage 9%
• magnetron sputtering 8%
• annealing 6%
• defects 5%
• curves 5%