Perspective on the development of microplasma technology: The role of oxygen in downstream microwave plasma

Y. T. Wu, J. D. Liao, C. C. Weng, M. C. Wang, J. E. Chang, C. H. Chen, M. Zharnikov

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

摘要

We studied the role of a minor fraction of oxygen in nitrogen and argon downstream microwave plasma in view of plasma-processing of ultrathin organic films - self-assembled monolayers (SAMs). As test systems we used SAMs of alkanethiolates on gold substrate. The plasma-induced processes in the films, including their chemical modification, oxidation, and partial decomposition, were monitored in detail. These processes could be directly correlated with the presence of reactive, oxygen-derived species in the plasma. The major plasma-induced processes could be well described by the first order kinetics; the respective reaction rates were also derived.

原文English
頁(從 - 到)89-95
頁數7
期刊Contributions to Plasma Physics
47
發行號1-2
DOIs
出版狀態Published - 2007

All Science Journal Classification (ASJC) codes

  • 凝聚態物理學

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