Photoelectrochemically recessed AlGaN/GaN monolithic inverter incorporating LiNbO3 ferroelectric film

Ching Ting Lee, Jhe Hao Chang, Chun Yen Tseng

研究成果: Conference contribution

摘要

In this work, the AlGaN/GaN monolithic inverters were integrated by the enhancement-mode metal-oxide-semiconductor high-electron-mobility transistors (E-mode MOSHEMTs) and the depletion-mode metal-oxide-semiconductor high-electron-mobility transistors (D-mode MOSHEMTs). For the fabrication of the E-mode MOSHEMTs, the LiNbO3 (LNO) ferroelectric films deposited on the photoelectrochemically (PEC)-recessed structure effectively compensated the two dimensional electron gas (2DEG) channel existed in the AlGaN/GaN heterostructure. For the fabrication of the D-mode MOSHEMTs, the PEC wet etching method and the surface treatment were utilized to form the various-thick etched AlGaN layers with low surface defects. Therefore, the operating current of the D-mode MOSHEMTs could be controlled. Finally, the resulting monolithic inverters with a suitable current ratio (β) of 25 were successfully fabricated. The corresponded output swing (between VOH-VOL), the noise margin high (NMH: VOH-VIH), and the noise margin low (NML: VIL-VOL) were respectively about 4.9 V, 1.9 V, and 1.7 V, when the input signal was 5 Vp-p. Most importantly, the corresponded output voltage (Vout) was 2.5 V which equaled to the half of VDD according to the voltage transfer characteristics (VTC) of the resulting inverters, when the input voltage (VIN) was 2.5 V. It indicated that the monolithic inverters have an unskewed inverter property.

原文English
主出版物標題Proceedings - 2015 IEEE 11th International Conference on ASIC, ASICON 2015
編輯Junyan Ren, Ting-Ao Tang, Fan Ye, Huihua Yu
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781479984831
DOIs
出版狀態Published - 2016 七月 21
事件11th IEEE International Conference on Advanced Semiconductor Integrated Circuits (ASIC), ASICON 2015 - Chengdu, China
持續時間: 2015 十一月 32015 十一月 6

出版系列

名字Proceedings - 2015 IEEE 11th International Conference on ASIC, ASICON 2015

Other

Other11th IEEE International Conference on Advanced Semiconductor Integrated Circuits (ASIC), ASICON 2015
國家China
城市Chengdu
期間15-11-0315-11-06

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

指紋 深入研究「Photoelectrochemically recessed AlGaN/GaN monolithic inverter incorporating LiNbO3 ferroelectric film」主題。共同形成了獨特的指紋。

  • 引用此

    Lee, C. T., Chang, J. H., & Tseng, C. Y. (2016). Photoelectrochemically recessed AlGaN/GaN monolithic inverter incorporating LiNbO3 ferroelectric film. 於 J. Ren, T-A. Tang, F. Ye, & H. Yu (編輯), Proceedings - 2015 IEEE 11th International Conference on ASIC, ASICON 2015 [7516990] (Proceedings - 2015 IEEE 11th International Conference on ASIC, ASICON 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ASICON.2015.7516990