Photooxidation of formic acid vs formate and ethanol vs ethoxy on TiO 2 and effect of adsorbed water on the rates of formate and formic acid photooxidation

Li Fen Liao, Wen Chun Wu, Chia Yuan Chen, Jong-Liang Lin

研究成果: Article同行評審

127 引文 斯高帕斯(Scopus)

摘要

Comparison of photooxidation rates of formic acid and formate on TiO 2 as well as the effect of adsorbed water on formate and formic acid photodecomposition rates have been investigated by Fourier transformed infrared spectroscopy. Adsorbed formic acid and formate are all photooxidized to CO 2 in O 2 . Formic acid on TiO 2 shows a photoreaction rate that is roughly 53 times that of formate groups for a same surface concentration. The presence of H 2 O can increase formate and formic acid photooxidation rates by a factor close to 2. In addition, photochemistry of adsorbed ethanol and ethoxy is also compared. It is found that ethanol is important for the formation of acetaldehyde, while ethoxy groups are photooxidized to adsorbed acetate, formate, and water. Possible reasons for these differences are discussed.

原文English
頁(從 - 到)7678-7685
頁數8
期刊Journal of Physical Chemistry B
105
發行號32
DOIs
出版狀態Published - 2001 八月 16

All Science Journal Classification (ASJC) codes

  • 物理與理論化學
  • 表面、塗料和薄膜
  • 材料化學

指紋

深入研究「Photooxidation of formic acid vs formate and ethanol vs ethoxy on TiO <sub>2</sub> and effect of adsorbed water on the rates of formate and formic acid photooxidation」主題。共同形成了獨特的指紋。

引用此