Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode

Jinho Yang, Rhet C. De Guzman, Steven O. Salley, K. Y.Simon Ng, Bing Hung Chen, Mark Ming Cheng Cheng

研究成果: Article

18 引文 (Scopus)

摘要

Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.

原文English
頁(從 - 到)520-525
頁數6
期刊Journal of Power Sources
269
DOIs
出版狀態Published - 2014 十二月 10

指紋

Plasma enhanced chemical vapor deposition
Silicon nitride
silicon nitrides
electric batteries
Anodes
anodes
lithium
vapor deposition
ions
Nitrides
nitrides
cycles
Thick films
accumulators
thick films
Copper
chemical composition
adhesion
Adhesion
industries

All Science Journal Classification (ASJC) codes

  • Renewable Energy, Sustainability and the Environment
  • Energy Engineering and Power Technology
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering

引用此文

Yang, Jinho ; De Guzman, Rhet C. ; Salley, Steven O. ; Ng, K. Y.Simon ; Chen, Bing Hung ; Cheng, Mark Ming Cheng. / Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode. 於: Journal of Power Sources. 2014 ; 卷 269. 頁 520-525.
@article{84561d889e534fa2a9354f784cab0037,
title = "Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode",
abstract = "Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86{\%} capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76{\%} after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.",
author = "Jinho Yang and {De Guzman}, {Rhet C.} and Salley, {Steven O.} and Ng, {K. Y.Simon} and Chen, {Bing Hung} and Cheng, {Mark Ming Cheng}",
year = "2014",
month = "12",
day = "10",
doi = "10.1016/j.jpowsour.2014.06.135",
language = "English",
volume = "269",
pages = "520--525",
journal = "Journal of Power Sources",
issn = "0378-7753",
publisher = "Elsevier",

}

Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode. / Yang, Jinho; De Guzman, Rhet C.; Salley, Steven O.; Ng, K. Y.Simon; Chen, Bing Hung; Cheng, Mark Ming Cheng.

於: Journal of Power Sources, 卷 269, 10.12.2014, p. 520-525.

研究成果: Article

TY - JOUR

T1 - Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode

AU - Yang, Jinho

AU - De Guzman, Rhet C.

AU - Salley, Steven O.

AU - Ng, K. Y.Simon

AU - Chen, Bing Hung

AU - Cheng, Mark Ming Cheng

PY - 2014/12/10

Y1 - 2014/12/10

N2 - Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.

AB - Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.

UR - http://www.scopus.com/inward/record.url?scp=84904971885&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84904971885&partnerID=8YFLogxK

U2 - 10.1016/j.jpowsour.2014.06.135

DO - 10.1016/j.jpowsour.2014.06.135

M3 - Article

AN - SCOPUS:84904971885

VL - 269

SP - 520

EP - 525

JO - Journal of Power Sources

JF - Journal of Power Sources

SN - 0378-7753

ER -