Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode

Jinho Yang, Rhet C. De Guzman, Steven O. Salley, K. Y.Simon Ng, Bing Hung Chen, Mark Ming Cheng Cheng

研究成果: Article同行評審

26 引文 斯高帕斯(Scopus)

摘要

Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.

原文English
頁(從 - 到)520-525
頁數6
期刊Journal of Power Sources
269
DOIs
出版狀態Published - 2014 十二月 10

All Science Journal Classification (ASJC) codes

  • 可再生能源、永續發展與環境
  • 能源工程與電力技術
  • 物理與理論化學
  • 電氣與電子工程

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