Power supply topologies for biphasic stimulation in inductively powered implants

Guoxing Wang, Wentai Liu, Mohanasankar Sivaprakasam, Mark S. Humayun, James D. Weiland

研究成果: Conference article同行評審

25 引文 斯高帕斯(Scopus)

摘要

Biphasic stimulation is commonly used for electrical stimulation of tissue in many implants. A dual voltage scheme is often used for the operation of the stimulus circuitry. Due to the advantages of wireless power transmission, an inductive link is used to recover the transmitted power and generate these voltages. This paper identifies the problem of additional power dissipation in the implant when the traditional rectifier topology with one diode is used. A dual diode topology is proposed which reduces the power dissipated in the implant by half. A detailed analysis for both topologies is done through derivation of expressions for the power losses on the primary and secondary coils. A comparison of single diode and dual diode topologies is presented under different conditions and inferences are drawn that can be used as design guidelines.

原文English
文章編號1465194
頁(從 - 到)2743-2746
頁數4
期刊Proceedings - IEEE International Symposium on Circuits and Systems
DOIs
出版狀態Published - 2005
事件IEEE International Symposium on Circuits and Systems 2005, ISCAS 2005 - Kobe, Japan
持續時間: 2005 5月 232005 5月 26

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程

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