| 原文 | English |
|---|---|
| 文章編號 | 7882835 |
| 期刊 | Proceedings of the International Conference on Ion Implantation Technology |
| DOIs | |
| 出版狀態 | Published - 2017 三月 20 |
| 事件 | 21st International Conference on Ion Implantation Technology, IIT 2016 - Tainan, Taiwan 持續時間: 2016 九月 26 → 2016 九月 30 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
引用此文
Lee, W-S., Current, M., Lin, Y. M., & Chang, R. D. (2017). Preface. Proceedings of the International Conference on Ion Implantation Technology, [7882835]. https://doi.org/10.1109/IIT.2016.7882835
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Lee, W-S, Current, M, Lin, YM & Chang, RD 2017, 'Preface', Proceedings of the International Conference on Ion Implantation Technology. https://doi.org/10.1109/IIT.2016.7882835
Preface. / Lee, Wen-Shi; Current, Michael; Lin, Yi Ming; Chang, Ruey Dar.
於: Proceedings of the International Conference on Ion Implantation Technology, 20.03.2017.研究成果: Editorial
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Lee W-S, Current M, Lin YM, Chang RD. Preface. Proceedings of the International Conference on Ion Implantation Technology. 2017 3月 20. 7882835. https://doi.org/10.1109/IIT.2016.7882835