Preliminary study of run-to-run control utilizing virtual metrology with reliance index

Chi An Kao, Fan Tien Cheng, Wei Ming Wu

研究成果: Conference contribution

12 引文 斯高帕斯(Scopus)

摘要

Incorporation of virtual metrology (VM) into run-to-run (R2R) control is one of key advanced process control (APC) focus areas of International Technology Roadmap for Semiconductors (ITRS) for 2009. However, a key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration. The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized. The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results. This paper proposes a novel scheme of run-to-run control that utilizes VM with RI in the feedback loop.

原文English
主出版物標題2011 IEEE International Conference on Automation Science and Engineering, CASE 2011
頁面256-261
頁數6
DOIs
出版狀態Published - 2011 12月 5
事件2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011 - Trieste, Italy
持續時間: 2011 8月 242011 8月 27

出版系列

名字IEEE International Conference on Automation Science and Engineering
ISSN(列印)2161-8070
ISSN(電子)2161-8089

Other

Other2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011
國家/地區Italy
城市Trieste
期間11-08-2411-08-27

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

指紋

深入研究「Preliminary study of run-to-run control utilizing virtual metrology with reliance index」主題。共同形成了獨特的指紋。

引用此