Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist

Jui Hsiang Liu, Jen Chieh Shih, Chih Hung Shih, Wei Ting Chen

研究成果: Article同行評審

7 引文 斯高帕斯(Scopus)

摘要

This study investigated the chemical behavior of polymers bearing cycloaliphatic bornyl units along with the steric difference of the chiral (+)-bornyl methacrylate [(+)-BMA] and racemic (±)-BMA, expressed in the physical properties of the copolymers and the resist characteristics. To do this, a series of copolymers containing (+)-bornyl methacrylate [(+)-BMA] and [(±)-BMA] units was synthesized. Comonomers of tert-butyl methacrylate (TBMA), methyl methacrylate (MMA), and maleic anhydride (MA) were used. The thermogravimetric curves, glass-transition temperature (Tg), and molecular weight (MW) of the copolymers were evaluated. Exposure characteristics of chemical-amplified positive photoresists comprising various copolymers were investigated. It was found that copolymers bearing (±)-BMA have higher Tg and better thermostability than those of copolymers containing (+)-BMA units. The copolymers with (±)-BMA units, however, revealed an inert photochemical behavior on the positive-tone photoresist. The patterning properties of the positive photoresist, composed of copolymers bearing (+)-BMA and (±)-BMA, and the photoacid generator (PAG) were also investigated.

原文English
頁(從 - 到)3538-3544
頁數7
期刊Journal of Applied Polymer Science
81
發行號14
DOIs
出版狀態Published - 2001 九月 29

All Science Journal Classification (ASJC) codes

  • 化學 (全部)
  • 表面、塗料和薄膜
  • 聚合物和塑料
  • 材料化學

指紋

深入研究「Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist」主題。共同形成了獨特的指紋。

引用此