A new electrically conductive photoresist has been developed. It is based on the dispersion of silver nanoflakes in a negative-tone photosensitive polyimide (PSPI) precursor. 2-Mereaptopropionic acid was used as the surfactant to modify the silver nanofiake surface for the dispersion of silver nanoflakes in the polymer. The silver/ PSPI nanocomposites showed electrical conductivity at a low silver content of 10 wt %. The electrical conductivity of the silver/PSPI nanocomposites ranged from 10 to 104 S/cm, which was dependent on the silver weight fraction in the resist formulation. Patterns with a resolution of 30 μm were obtained from the silver/PSPI nanocomposites. The silver/PSPI nanocomposites had excellent thermal properties. Their glass transition temperatures were above 380 °C and thermal decomposition temperatures were over 420 °C.
|頁（從 - 到）||1575-1583|
|期刊||Journal of Polymer Science, Part A: Polymer Chemistry|
|出版狀態||Published - 2009 三月 15|
All Science Journal Classification (ASJC) codes