Preparation of oxidized nano-porous-silicon thin films for ultra-violet optical-sensing applications

Mien Liang Lin, Yu Cheng Lin, Kuen Hsien Wu, Cih Pu Huang

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

摘要

Oxidized nano-porous-silicon (ONPS) thin films were prepared by rapid-thermal oxidization of nano-porous silicon films that were formed on Si substrates with an anodization technology. The ONPS films exhibited high responsivity for incident ultra-violet (UV) light with wavelengths between 300 nm and 400 nm. Under illumination of incident 350 nm UV light and 5 V bias, the ONPS-based photodiodes obtained a high photo current of 3.24 mA/cm2 and large photo-to-dark current ratio of 300, indicating that the ONPS thin films have significant potential for applications of UV optical-sensing devices. Crown

原文English
頁(從 - 到)275-277
頁數3
期刊Thin Solid Films
529
DOIs
出版狀態Published - 2013 二月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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