Properties of MgTiO₃ thin films prepared by RF magnetron sputtering for microwave application

Material Science

• Film 100%
• Thin Films 100%
• Magnetron Sputtering 100%
• Microwave Technology 100%
• X-Ray Diffraction 40%
• Dielectric Material 20%
• Scanning Electron Microscopy 20%
• Crystal Structure 20%
• Surface Morphology 20%
• Permittivity 20%
• Sintering Temperature 20%
• Atomic Force Microscopy 20%
• Grain Size 20%
• Capacitor 20%

Keyphrases

• Reactive RF Magnetron Sputtering 20%