Quantitative AES investigation of magnetron sputtered Ti-Al-N films

Bor Yuan Shew, Jow-Lay Huang

研究成果: Article同行評審

16 引文 斯高帕斯(Scopus)

摘要

The quantitative analysis of Ti-Al-N films by Auger electron spectroscopy (AES) is not an easy task, mainly because of the overlapping of nitrogen and titanium in Auger signals and the Auger cross-transition of aluminum in nitrides. A quantitative AES analysis method was proposed in this report. The signal intensity of nitrogen was determined by subtracting the contribution of Ti from the overlapped signals (Dawson*s method). The sensitivity factors were determined following Hofmann*s derivation. X-ray diffraction was used for determining the critical N2 flow above which the ordered B1-NaCI structure of Ti-AI-N occurred. The relative sensitivity of Al/N from Hofmann*s derivation was then corrected using a AIN standard as the formation of aluminurn nitride was detected. The results of quantitative AES analysis for Ti-AI-N films by the method proposed in this report was in excellent agreement with that determined from the WDS with standards.

原文English
頁(從 - 到)66-72
頁數7
期刊Surface and Coatings Technology
73
發行號1-2
DOIs
出版狀態Published - 1995 一月 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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