Rapid isothermal processing of strained GeSi layers

Deepak K. Nayak, Kamyar Kamjoo, Jin Suk Park, Jason C.S. Woo, Kang L. Wang

研究成果: Article同行評審

70 引文 斯高帕斯(Scopus)

指紋 深入研究「Rapid isothermal processing of strained GeSi layers」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science