摘要
GaAs/AlGaAs vertical cavity surface emitting lasers (VCSELs) with two semiconductor distributed Bragg reflectors (DBRs) were grown by molecular beam epitaxy. The threshold current was found to be 20-50% less on an average for the bulk VCSELs with an active layer of 0.47 μm thick grown on the 4° off-orientation (001) substrates than those on the on-orientation ones. The lower threshold current was attributed to the smoother interfaces of the Al0.1Ga0.9As/AlAs DBRs in the off-orientation growth observed by transmission electron microscopy.
原文 | English |
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頁(從 - 到) | 1057-1061 |
頁數 | 5 |
期刊 | Journal of Crystal Growth |
卷 | 111 |
發行號 | 1-4 |
DOIs | |
出版狀態 | Published - 1991 5月 2 |
All Science Journal Classification (ASJC) codes
- 凝聚態物理學
- 無機化學
- 材料化學