Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication

Chian Yuh Sin, Bing Hung Chen, W. L. Loh, J. Yu, P. Yelehanka, A. See, L. Chan

研究成果: Article同行評審

25 引文 斯高帕斯(Scopus)

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深入研究「Resist trimming in high-density CF<sub>4</sub>/O<sub>2</sub> plasmas for sub-0.1 μm device fabrication」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Physics & Astronomy