Resist trimming technique in CF4/O2 high-density plasmas for sub-0.1 μm MOSFET fabrication using 248-nm lithography

Chian Yuh Sin, Bing-Hung Chen, W. L. Loh, J. Yu, P. Yelehanka, L. Chan

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds