Roller imprinting based on focus infrared heating

Chun Hung Chen, Yung Chun Lee, Chii Dong Chen, Shuei Jin Lai, Shih Jay Liaw

研究成果: Conference contribution

1 引文 (Scopus)

摘要

In this paper we report the development of a new roller imprinting method which is capable of transferring patterns with line-width down to few hundreds nm from a silicon mold to a substrate based on focused infrared heating. This new technique significantly increases the size of imprinting area as well as the imprinting speed as compared to conventional IR-Laser Assisted Imprinting (IR-LAI) method, and solves the uniformity problem of applied pressure. We utilize a glass cylinder to focus the infrared light source into a line, which can heat up the silicon mold in a localized way. The glass cylinder also produces a line-type pre-loaded force on the mold so that it can closely press against the substrate. After the heating by IR sources, the fast rising temperature in the silicon mold and the PMMA on the silicon substrate can go beyond the glass transition temperature of PMNMA. At the same time, the patterns which are on the mold are transferred to the PMMA. After cooling, the residual PMMA layer is etched out which complete this IR imprinting process. The advantages of this method are, using inexpensive IR sources such as lamps, continuously imprinting for large-area with line-width down to sub-micro and even nmscale. In the mean time, this method opens up many new directions and possibilities for further studies.

原文English
主出版物標題3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
頁面877-880
頁數4
DOIs
出版狀態Published - 2008 九月 1
事件3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Sanya, China
持續時間: 2008 一月 62008 一月 9

出版系列

名字3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

Other

Other3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
國家China
城市Sanya
期間08-01-0608-01-09

指紋

Infrared heating
Silicon
Linewidth
Substrates
Glass
Electric lamps
Light sources
Cooling
Infrared radiation
Heating
Lasers
Temperature

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

引用此文

Chen, C. H., Lee, Y. C., Chen, C. D., Lai, S. J., & Liaw, S. J. (2008). Roller imprinting based on focus infrared heating. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 (頁 877-880). [4484463] (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS). https://doi.org/10.1109/NEMS.2008.4484463
Chen, Chun Hung ; Lee, Yung Chun ; Chen, Chii Dong ; Lai, Shuei Jin ; Liaw, Shih Jay. / Roller imprinting based on focus infrared heating. 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. 頁 877-880 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).
@inproceedings{dcf0d223c71f4cb1a1edd184499691de,
title = "Roller imprinting based on focus infrared heating",
abstract = "In this paper we report the development of a new roller imprinting method which is capable of transferring patterns with line-width down to few hundreds nm from a silicon mold to a substrate based on focused infrared heating. This new technique significantly increases the size of imprinting area as well as the imprinting speed as compared to conventional IR-Laser Assisted Imprinting (IR-LAI) method, and solves the uniformity problem of applied pressure. We utilize a glass cylinder to focus the infrared light source into a line, which can heat up the silicon mold in a localized way. The glass cylinder also produces a line-type pre-loaded force on the mold so that it can closely press against the substrate. After the heating by IR sources, the fast rising temperature in the silicon mold and the PMMA on the silicon substrate can go beyond the glass transition temperature of PMNMA. At the same time, the patterns which are on the mold are transferred to the PMMA. After cooling, the residual PMMA layer is etched out which complete this IR imprinting process. The advantages of this method are, using inexpensive IR sources such as lamps, continuously imprinting for large-area with line-width down to sub-micro and even nmscale. In the mean time, this method opens up many new directions and possibilities for further studies.",
author = "Chen, {Chun Hung} and Lee, {Yung Chun} and Chen, {Chii Dong} and Lai, {Shuei Jin} and Liaw, {Shih Jay}",
year = "2008",
month = "9",
day = "1",
doi = "10.1109/NEMS.2008.4484463",
language = "English",
isbn = "9781424419081",
series = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS",
pages = "877--880",
booktitle = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008",

}

Chen, CH, Lee, YC, Chen, CD, Lai, SJ & Liaw, SJ 2008, Roller imprinting based on focus infrared heating. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008., 4484463, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS, 頁 877-880, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, Sanya, China, 08-01-06. https://doi.org/10.1109/NEMS.2008.4484463

Roller imprinting based on focus infrared heating. / Chen, Chun Hung; Lee, Yung Chun; Chen, Chii Dong; Lai, Shuei Jin; Liaw, Shih Jay.

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 877-880 4484463 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).

研究成果: Conference contribution

TY - GEN

T1 - Roller imprinting based on focus infrared heating

AU - Chen, Chun Hung

AU - Lee, Yung Chun

AU - Chen, Chii Dong

AU - Lai, Shuei Jin

AU - Liaw, Shih Jay

PY - 2008/9/1

Y1 - 2008/9/1

N2 - In this paper we report the development of a new roller imprinting method which is capable of transferring patterns with line-width down to few hundreds nm from a silicon mold to a substrate based on focused infrared heating. This new technique significantly increases the size of imprinting area as well as the imprinting speed as compared to conventional IR-Laser Assisted Imprinting (IR-LAI) method, and solves the uniformity problem of applied pressure. We utilize a glass cylinder to focus the infrared light source into a line, which can heat up the silicon mold in a localized way. The glass cylinder also produces a line-type pre-loaded force on the mold so that it can closely press against the substrate. After the heating by IR sources, the fast rising temperature in the silicon mold and the PMMA on the silicon substrate can go beyond the glass transition temperature of PMNMA. At the same time, the patterns which are on the mold are transferred to the PMMA. After cooling, the residual PMMA layer is etched out which complete this IR imprinting process. The advantages of this method are, using inexpensive IR sources such as lamps, continuously imprinting for large-area with line-width down to sub-micro and even nmscale. In the mean time, this method opens up many new directions and possibilities for further studies.

AB - In this paper we report the development of a new roller imprinting method which is capable of transferring patterns with line-width down to few hundreds nm from a silicon mold to a substrate based on focused infrared heating. This new technique significantly increases the size of imprinting area as well as the imprinting speed as compared to conventional IR-Laser Assisted Imprinting (IR-LAI) method, and solves the uniformity problem of applied pressure. We utilize a glass cylinder to focus the infrared light source into a line, which can heat up the silicon mold in a localized way. The glass cylinder also produces a line-type pre-loaded force on the mold so that it can closely press against the substrate. After the heating by IR sources, the fast rising temperature in the silicon mold and the PMMA on the silicon substrate can go beyond the glass transition temperature of PMNMA. At the same time, the patterns which are on the mold are transferred to the PMMA. After cooling, the residual PMMA layer is etched out which complete this IR imprinting process. The advantages of this method are, using inexpensive IR sources such as lamps, continuously imprinting for large-area with line-width down to sub-micro and even nmscale. In the mean time, this method opens up many new directions and possibilities for further studies.

UR - http://www.scopus.com/inward/record.url?scp=50249089641&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50249089641&partnerID=8YFLogxK

U2 - 10.1109/NEMS.2008.4484463

DO - 10.1109/NEMS.2008.4484463

M3 - Conference contribution

AN - SCOPUS:50249089641

SN - 9781424419081

T3 - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

SP - 877

EP - 880

BT - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008

ER -

Chen CH, Lee YC, Chen CD, Lai SJ, Liaw SJ. Roller imprinting based on focus infrared heating. 於 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 877-880. 4484463. (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS). https://doi.org/10.1109/NEMS.2008.4484463