Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer

Yueh Chieh Chu, Gerald Jiang, Chi Chang, Jyh Ming Ting, Hsin Le Lee, Yonhua Tzeng

研究成果: Conference contribution

摘要

This paper reports on room-temperature high-density diamond seeding for low-temperature microwave plasma enhanced chemical vapor deposition of nanocrystalline diamond (NCD) on W/Si substrates. A tungsten layer acts as a diamond nucleation-enhancing layer. Formation of tungsten-carbide (WC) complex increases the initial nucleation density and plays an important role in facilitating diamond growth characteristics. Microwave plasma-enhanced chemical vapor deposition is applied to synthesize diamond films in Ar diluted by methane without hydrogen additives at low temperature. NCD seeding and film formation were investigated as a function of the thickness of tungsten interfacial layer. Raman spectroscopy, SEM, AFM and TEM were applied to characterize NCD films in order to gain insight into the initial stage of NCD diamond synthesis.

原文English
主出版物標題2011 11th IEEE International Conference on Nanotechnology, NANO 2011
頁面1367-1370
頁數4
DOIs
出版狀態Published - 2011 十二月 1
事件2011 11th IEEE International Conference on Nanotechnology, NANO 2011 - Portland, OR, United States
持續時間: 2011 八月 152011 八月 19

出版系列

名字Proceedings of the IEEE Conference on Nanotechnology
ISSN(列印)1944-9399
ISSN(電子)1944-9380

Other

Other2011 11th IEEE International Conference on Nanotechnology, NANO 2011
國家United States
城市Portland, OR
期間11-08-1511-08-19

指紋

Nanodiamonds
Tungsten
Diamond
Plasma enhanced chemical vapor deposition
inoculation
Diamonds
tungsten
diamonds
Microwaves
vapor deposition
microwaves
room temperature
Diamond films
Temperature
diamond films
Nucleation
nucleation
tungsten carbides
Tungsten carbide
Methane

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

引用此文

Chu, Y. C., Jiang, G., Chang, C., Ting, J. M., Lee, H. L., & Tzeng, Y. (2011). Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. 於 2011 11th IEEE International Conference on Nanotechnology, NANO 2011 (頁 1367-1370). [6144477] (Proceedings of the IEEE Conference on Nanotechnology). https://doi.org/10.1109/NANO.2011.6144477
Chu, Yueh Chieh ; Jiang, Gerald ; Chang, Chi ; Ting, Jyh Ming ; Lee, Hsin Le ; Tzeng, Yonhua. / Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. 頁 1367-1370 (Proceedings of the IEEE Conference on Nanotechnology).
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abstract = "This paper reports on room-temperature high-density diamond seeding for low-temperature microwave plasma enhanced chemical vapor deposition of nanocrystalline diamond (NCD) on W/Si substrates. A tungsten layer acts as a diamond nucleation-enhancing layer. Formation of tungsten-carbide (WC) complex increases the initial nucleation density and plays an important role in facilitating diamond growth characteristics. Microwave plasma-enhanced chemical vapor deposition is applied to synthesize diamond films in Ar diluted by methane without hydrogen additives at low temperature. NCD seeding and film formation were investigated as a function of the thickness of tungsten interfacial layer. Raman spectroscopy, SEM, AFM and TEM were applied to characterize NCD films in order to gain insight into the initial stage of NCD diamond synthesis.",
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Chu, YC, Jiang, G, Chang, C, Ting, JM, Lee, HL & Tzeng, Y 2011, Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. 於 2011 11th IEEE International Conference on Nanotechnology, NANO 2011., 6144477, Proceedings of the IEEE Conference on Nanotechnology, 頁 1367-1370, 2011 11th IEEE International Conference on Nanotechnology, NANO 2011, Portland, OR, United States, 11-08-15. https://doi.org/10.1109/NANO.2011.6144477

Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. / Chu, Yueh Chieh; Jiang, Gerald; Chang, Chi; Ting, Jyh Ming; Lee, Hsin Le; Tzeng, Yonhua.

2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1367-1370 6144477 (Proceedings of the IEEE Conference on Nanotechnology).

研究成果: Conference contribution

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Chu YC, Jiang G, Chang C, Ting JM, Lee HL, Tzeng Y. Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. 於 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1367-1370. 6144477. (Proceedings of the IEEE Conference on Nanotechnology). https://doi.org/10.1109/NANO.2011.6144477