Room temperature Si δ -growth on Ge incorporating high- K dielectric for metal oxide semiconductor applications

Augustin J. Hong, Masaaki Ogawa, Kang L. Wang, Yong Wang, Jin Zou, Zheng Xu, Yang Yang

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

摘要

A low temperature Al2O3/4 monolayer amorphous Si gate stack process was demonstrated on p -type Ge wafers using atomic layer deposition and molecular beam epitaxy. Multifrequency capacitance-voltage (C-V) and current-voltage (I-V) characteristics showed excellent electrical properties of the Pt Al2O3/4 ML SiGe metal oxide semiconductor capacitor. No kinks from 1 MHz to 4 kHz and a leakage current density of 2.6× 10-6 A cm2 at 1 V with an equivalent oxide thickness of 2.5 nm. The interface characterization using a conductance method showed that interface trap density at the near midgap was 8× 10 12 eV-1 cm-2 and a mean capture cross section of holes was extracted to be 10-16 cm2.

原文English
文章編號023501
期刊Applied Physics Letters
93
發行號2
DOIs
出版狀態Published - 2008 七月 14

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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