Run-to-run control utilizing the AVM system in the solar industry

Li Ren Lin, Yu Chen Chiu, Wei Cheng Mo, Chi An Kao, Tzu Ming Liu, Deng Lin Zeng, Fan Tien Cheng

研究成果: Conference contribution

7 引文 斯高帕斯(Scopus)

摘要

• The AVM system has been installed in all of the plasma enhanced chemical vapor deposition (PECVD) tools of Motech Industries, Inc. Fab 1. • Currently, a joint development project to deploy a run-to-run (R2R) control scheme utilizing the AVM system is underway. • R2R control [1] is the technique of modifying recipe parameters or the selection of control parameters between runs to improve processing performance. The R2R control is also called the tube-to-tube (T2T) control for the PECVD tools in the solar industry. • In the deposition process of the solar-cell manufacturing, the sampling rate is less than 10%. However, the T2T control requires 100% total inspection. To accomplish this requirement, large amount of measurement is needed, and thus leads to the increase of the production cycle time and cost. • To resolve the problem mentioned above, Virtual Metrology [2] for the T2T control was proposed. • Incorporation of VM into R2R control is one of key APC focus areas of ITRS for 2009 [3]. • A key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration [4]. • The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized [4]. • The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results [5]. • This paper proposes a novel scheme of R2R control that utilizes VM with RI/GSI [5][10] in the feedback loop.

原文English
主出版物標題2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011
出版狀態Published - 2011
事件2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011 - Hsinchu, Taiwan
持續時間: 2011 9月 52011 9月 6

出版系列

名字IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN(列印)1523-553X

Other

Other2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011
國家/地區Taiwan
城市Hsinchu
期間11-09-0511-09-06

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 一般工程
  • 工業與製造工程
  • 電氣與電子工程

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