Sensitivity of carrier mobility to edge defects in ultra-narrow graphene nanoribbons

M. Poljak, K. L. Wang, T. Suligoj

研究成果: Paper同行評審

2 引文 斯高帕斯(Scopus)

摘要

We report the results of a multi-scale transport modeling of ultra-narrow GNRs. Atomistic NEGF approach is combined with semiclassical mobility modeling in order to quantify the sensitivity of mobility to edge defects. We find that the mobility in defected GNRs deteriorates more strongly as GNR width is scaled down compared to ideal devices, and that even the minimum mobility variation spans almost one order of magnitude.

原文English
頁面37-40
頁數4
DOIs
出版狀態Published - 2014
事件2014 15th International Conference on Ultimate Integration on Silicon, ULIS 2014 - Stockholm, Sweden
持續時間: 2014 4月 72014 4月 9

Conference

Conference2014 15th International Conference on Ultimate Integration on Silicon, ULIS 2014
國家/地區Sweden
城市Stockholm
期間14-04-0714-04-09

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程

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