Single-domain Si (110) -16×2 surface fabricated by electromigration

Yoichi Yamada, Antoine Girard, Hidehito Asaoka, Hiroyuki Yamamoto, Shin Ichi Shamoto

研究成果: Article同行評審

28 引文 斯高帕斯(Scopus)

摘要

Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.

原文English
文章編號153309
期刊Physical Review B - Condensed Matter and Materials Physics
76
發行號15
DOIs
出版狀態Published - 2007 十月 23

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學

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