Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.
|期刊||Physical Review B - Condensed Matter and Materials Physics|
|出版狀態||Published - 2007 十月 23|
All Science Journal Classification (ASJC) codes