Slit-Mura detection through non-contact optical measurements of in-line spectrometer for TFT-LCDs

Fu Ming Tzu, Jung Hua Chou

研究成果: Article同行評審

4 引文 斯高帕斯(Scopus)

摘要

Slit-Mura defect is a notorious yield flaw of color filters. In this study, an innovative non-contact in-line optical inspection method is developed to detect low contrast slit Mura through quantitative measurements by a spectrometer. Using the features of either thickness or chromaticity profiles across a slit Mura, a thickness difference from 21 nm to 41 nm of color filters can be differentiated accurately. Thus, the quality of color filters can be accessed in-line during the manufacturing process TFT-LCDs.

原文English
頁(從 - 到)364-369
頁數6
期刊IEICE Transactions on Electronics
E92-C
發行號3
DOIs
出版狀態Published - 2009 一月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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