Strain distribution of mbe grown gexsi1-x/si layers by raman scattering

S. J. Chang, M. A. Kallel, K. L. Wang

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

The strain distribution of strained layer superlattice (SLS) as a function of the distance from the interface has been studied by Raman Spectroscopy. A small angle bevel was made by angle lapping on a given thick GexSi1-x/Si SLS so that it is possible to probe the structure at different thicknesses. The Raman spectrum as a function of the distance from interface is then obtained. The results indicate that, as we move away from the interface, compression strain in the alloy layers decreases, tensile strain in the Si layers increases and lower concentration of crystalline defects are present as observed from linewidth measurement.

原文English
頁(從 - 到)163-168
頁數6
期刊Proceedings of SPIE - The International Society for Optical Engineering
946
DOIs
出版狀態Published - 1988 8月 9

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

指紋

深入研究「Strain distribution of mbe grown gexsi1-x/si layers by raman scattering」主題。共同形成了獨特的指紋。

引用此