Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature

Zhang Song, Tiphaine Bourgeteau, Itaru Raifuku, Yvan Bonnassieux, Erik Johnson, Yasuaki Ishikawa, Martin Foldyna, Pere Roca i Cabarrocas, Yukiharu Uraoka

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

Structure and crystal growth of nickel oxide thin films (10–300 nm) prepared by low-temperature sputtering have been investigated by scanning electron microscopy (SEM), X-ray diffraction, and spectroscopic ellipsometry. Very thin films are compact and homogeneous and are made of almost randomly oriented crystals. A preferential growth direction is then observed following the (111), (220) and (311) planes to the detriment of the (222) and (200) planes, inducing a growth of the materials in columns perpendicularly to the substrate. An optical model able to account for this particular structure has been created from the spectroscopic ellipsometry measurements, and correlates well with the structure observed by SEM. Moreover, it enables an accurate estimation of the thickness without damage to the substrate.

原文English
頁(從 - 到)209-215
頁數7
期刊Thin Solid Films
646
DOIs
出版狀態Published - 2018 一月 31

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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