Structure and electrical properties of MgTiO₃ thin films deposited by rf magnetron sputtering

Keyphrases

• Atomic Force Microscopy 33%
• Electrical Properties 100%
• Grain Size 33%
• Highly Oriented 33%
• MgTiO3 100%
• MgTiO3 Thin Films 100%
• Microstructure Morphology 33%
• N-type Si 33%
• Power Density 66%
• RF Magnetron Sputtering 100%
• RF Power 66%
• Scanning Electron Microscopy 33%
• Si (100) Substrate 33%
• Si(111) 33%
• Sintering Temperature 33%
• Structure-property Relationships 100%
• Substrate Temperature 66%
• Surface Morphology 33%
• X Ray Diffraction 33%

Material Science

• Atomic Force Microscopy 33%
• Density 66%
• Film 66%
• Grain Size 33%
• Magnetron Sputtering 100%
• Scanning Electron Microscopy 33%
• Sintering Temperature 33%
• Surface Morphology 33%
• Thin Films 100%
• X-Ray Diffraction 33%