Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

Kuo Tsai Wu; Sheng Jye Hwang; Huei Huang Lee

doi:10.3390/app9194110

Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

Kuo Tsai Wu, Sheng Jye Hwang, Huei Huang Lee

研究成果: Article › 同行評審

1 引文斯高帕斯（Scopus）

摘要

Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

原文	English
文章編號	4110
期刊	Applied Sciences (Switzerland)
卷	9
發行號	19
DOIs	https://doi.org/10.3390/app9194110
出版狀態	Published - 2019 10月 1

All Science Journal Classification (ASJC) codes

一般材料科學
儀器
一般工程
製程化學與技術
電腦科學應用
流體流動和轉移過程

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title = "Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses",

abstract = "Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.",

author = "Wu, {Kuo Tsai} and Hwang, {Sheng Jye} and Lee, {Huei Huang}",

note = "Funding Information: The work is supported by Contrel Technology Co., Ltd. and the project title is {"}Wafer level camera UV curing high precision imprint exposure machine development plan{"}.This research received no external funding Publisher Copyright: {\textcopyright} 2019 by the authors.",

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doi = "10.3390/app9194110",

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AU - Wu, Kuo Tsai

AU - Hwang, Sheng Jye

AU - Lee, Huei Huang

N1 - Funding Information: The work is supported by Contrel Technology Co., Ltd. and the project title is "Wafer level camera UV curing high precision imprint exposure machine development plan".This research received no external funding Publisher Copyright: © 2019 by the authors.

PY - 2019/10/1

Y1 - 2019/10/1

N2 - Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

AB - Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

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Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

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