Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions

Cheng Shi Chen, Chuan Pu Liu, C. Y.A. Tsao, Heng Ghieh Yang

研究成果: Article同行評審

35 引文 斯高帕斯(Scopus)

摘要

The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness.

原文English
頁(從 - 到)715-719
頁數5
期刊Scripta Materialia
51
發行號7
DOIs
出版狀態Published - 2004 7月 1

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 材料力學
  • 機械工業
  • 金屬和合金

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