Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells

Wei Lun Lu, Kuo Chan Huang, Pin Kun Hung, Mau Phon Houng

研究成果: Article

6 引文 (Scopus)

摘要

The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.

原文English
頁(從 - 到)52-56
頁數5
期刊Journal of Physics and Chemistry of Solids
73
發行號1
DOIs
出版狀態Published - 2012 一月 1

指紋

Silicon solar cells
Optical properties
solar cells
optical properties
Thin films
thin films
haze
etchants
Wet etching
etching
Solar cells
acids
Acids
short circuit currents
Short circuit currents
Light scattering
Magnetron sputtering
Thin film solar cells
Etching
analyzers

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

引用此文

@article{03b26faf089b4936b89702eeefac5864,
title = "Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells",
abstract = "The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580{\%} as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0{\%} at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8{\%} for the a-Si solar cells with textured ZnO:Al films was achieved.",
author = "Lu, {Wei Lun} and Huang, {Kuo Chan} and Hung, {Pin Kun} and Houng, {Mau Phon}",
year = "2012",
month = "1",
day = "1",
doi = "10.1016/j.jpcs.2011.09.018",
language = "English",
volume = "73",
pages = "52--56",
journal = "Journal of Physics and Chemistry of Solids",
issn = "0022-3697",
publisher = "Elsevier Limited",
number = "1",

}

Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells. / Lu, Wei Lun; Huang, Kuo Chan; Hung, Pin Kun; Houng, Mau Phon.

於: Journal of Physics and Chemistry of Solids, 卷 73, 編號 1, 01.01.2012, p. 52-56.

研究成果: Article

TY - JOUR

T1 - Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells

AU - Lu, Wei Lun

AU - Huang, Kuo Chan

AU - Hung, Pin Kun

AU - Houng, Mau Phon

PY - 2012/1/1

Y1 - 2012/1/1

N2 - The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.

AB - The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.

UR - http://www.scopus.com/inward/record.url?scp=81155128693&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=81155128693&partnerID=8YFLogxK

U2 - 10.1016/j.jpcs.2011.09.018

DO - 10.1016/j.jpcs.2011.09.018

M3 - Article

AN - SCOPUS:81155128693

VL - 73

SP - 52

EP - 56

JO - Journal of Physics and Chemistry of Solids

JF - Journal of Physics and Chemistry of Solids

SN - 0022-3697

IS - 1

ER -