TY - JOUR
T1 - Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells
AU - Lu, Wei Lun
AU - Huang, Kuo Chan
AU - Hung, Pin Kun
AU - Houng, Mau Phon
N1 - Funding Information:
The authors would like to thank Dr. Gwo-Sen Lin at NexPower Technology Corporation for his helpful discussion. They also want to thank Mr. Yu-Yao Chen, the CTO at E-HENG Technology Co., Ltd., for technical assistance. This work was also supported by the National Science Council of Taiwan under Contract number NSC-97-2221-E-006–239-MY2.
PY - 2012/1
Y1 - 2012/1
N2 - The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.
AB - The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.
UR - https://www.scopus.com/pages/publications/81155128693
UR - https://www.scopus.com/pages/publications/81155128693#tab=citedBy
U2 - 10.1016/j.jpcs.2011.09.018
DO - 10.1016/j.jpcs.2011.09.018
M3 - Article
AN - SCOPUS:81155128693
SN - 0022-3697
VL - 73
SP - 52
EP - 56
JO - Journal of Physics and Chemistry of Solids
JF - Journal of Physics and Chemistry of Solids
IS - 1
ER -
SDG 7 經濟實惠的清潔能源