Sub-0.1 μm MOSFET fabrication using 248 nm lithography by resist trimming technique in high density plasmas

Chian Yuh Sin, Loh Wei Loong, Bing Hung Chen, Yujie, Pradeep Yelehanka, Lap Chan

研究成果: Conference contribution

3 引文 斯高帕斯（Scopus）

指紋 深入研究「Sub-0.1 μm MOSFET fabrication using 248 nm lithography by resist trimming technique in high density plasmas」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds