Sulphur content and the hydrogen evolving activity of NiSx deposits using statistical experimental strategies

T. C. Wen, S. M. Lin, J. M. Tsai

研究成果: Article同行評審

49 引文 斯高帕斯(Scopus)

摘要

The effect of such electroplating conditions as current density, thiourea (TU) concentration, temperature and pH on the sulphur content of NiSx deposited electrodes has been systematically studied using fractional factorial design and response surface methodology. Fractional factorial analysis indicates that the main and interaction effects of TU concentration and current density are the key variables influencing sulphur content in a NiSx deposit. Empirical models for sulphur content and hydrogen evolution overpotential are fitted and plotted, using central composite experimental design, as contour diagrams in order to facilitate comparison with experimental sulphur content trends and hydrogen evolving activity. The results show that, for deposits containing > 12 wt % sulphur content, hydrogen evolving activity increases with increasing sulphur content, while for those possessing < 12 wt% sulphur content, hydrogen evolution overpotential decreases with increasing electroplating current density.

原文English
頁(從 - 到)233-238
頁數6
期刊Journal of Applied Electrochemistry
24
發行號3
DOIs
出版狀態Published - 1994 三月 1

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Electrochemistry
  • Materials Chemistry

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