Super low noise InGaP gated PHEMT

H. K. Huang, Y. H. Wang, C. L. Wu, J. C. Wang, C. S. Chang

研究成果: Article同行評審

14 引文 斯高帕斯(Scopus)

摘要

Very high performance InGaP/InGaAs/GaAs PHEMTs will be demonstrated. The fabricated InGaP gated PHEMTs devices with 0.25 × 160 μm 2 and 0.25 × 300 μm 2 of gate dimensions show 304 mA/mm and 330 mA/mm of saturation drain current at V GS = 0 V, V DS = 2 V, and 320 mS/mm and 302 mS/mm of extrinsic transconductances, respectively. Noise figures for 160 μm and 300 μm gate-width devices at 12 GHz are measured to be 0.46 dB with a 13 dB associated gain and 0.49 dB with a 12.85 dB associated gain, respectively. With such a high gain and low noise, the drain-to-gate breakdown voltage can be larger than 11 V. Standard deviation in the threshold voltage of 22 mV for 160 μm gate-width devices across a 4-in wafer can be achieved using a highly selective wet recess etching process. Good thermal stability of these InGaP gated PHEMTs is also presented.

原文English
頁(從 - 到)70-72
頁數3
期刊IEEE Electron Device Letters
23
發行號2
DOIs
出版狀態Published - 2002 二月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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