Surface properties of film deposition using molecular dynamics simulation

Engineering & Materials Science

• Computer simulation 48%
• Deposition rates 22%
• Film growth 28%
• Molecular dynamics 100%
• Sputtering 22%
• Substrates 62%
• Surface properties 88%
• Surface roughness 29%
• Temperature 21%
• Thin films 16%

Chemical Compounds

• Ambient Reaction Temperature 12%
• Deposition Process 24%
• Energy 21%
• Liquid Film 42%
• Molecular Dynamics 65%
• Simulation 56%
• Sputtering 24%
• Surface 28%

Physics & Astronomy

• energy 10%
• molecular dynamics 64%
• room temperature 9%
• roughness 29%
• simulation 33%
• sputtering 13%
• surface properties 90%
• temperature 10%
• thin films 9%