Synthesis of cobalt nanoparticles by DC magnetron sputtering and the effects of electron bombardment

Bing Xian Chung, Chuan Pu Liu

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

摘要

Dispersive cobalt nanoparticles are fabricated during deposition on SiO2/Si (001) substrates by direct current (DC) magnetron sputtering at room temperature. It is found that Co nanoparticles ranging from a few nanometers to some tens of nanometers in diameter can be fabricated by applying positive substrate biases. Larger polycrystalline cobalt nanoparticles are formed by the coalescence from smaller single-crystalline ones which may exist in fcc or hcp phase. Size reduction and uniformity of the nanoparticle array can be further enhanced by applying larger positive biases due to electron charging effects. Under the charging effects, the growth kinetics can be altered from VW to SK-like growth mode.

原文English
頁(從 - 到)1437-1440
頁數4
期刊Materials Letters
58
發行號9
DOIs
出版狀態Published - 2004 一月 2

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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