摘要
This paper proposes to use Muther's systematic layout planning procedure as the infrastructure to solve a fab layout design problem. A multiple objective decision making tool, analytic hierarchy process, is then proposed to evaluate the design alternatives. The proposed procedure is illustrated to be a viable approach for solving a fab layout design problem through a real-world case study. It features both the simplicity of the design process and the objectivity of the multiple-criteria evaluation process as opposed to existing solution methodologies.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 1359-1371 |
| 頁數 | 13 |
| 期刊 | International Journal of Operations and Production Management |
| 卷 | 20 |
| 發行號 | 11 |
| DOIs | |
| 出版狀態 | Published - 2000 12月 1 |
All Science Journal Classification (ASJC) codes
- 一般決策科學
- 策略與管理
- 技術與創新管理
指紋
深入研究「Systematic layout planning: A study on semiconductor wafer fabrication facilities」主題。共同形成了獨特的指紋。引用此
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