TEM validation of CD AFM image reconstruction

Gregory A. Dahlen, Lars Mininni, Marc Osborn, Bernard Haochih Liu, Jason R. Osborne, Bryan Tracy, Amalia Del Rosario

研究成果: Conference contribution

14 引文 斯高帕斯(Scopus)

摘要

An extensive test series was undertaken to validate image reconstruction algorithms used with critical dimension atomic force microscopy (CD AFM). Transmission electron microscopy (TEM) was used as the reference metrology system (RMS) with careful attention devoted to both calibration and fiducial marking of TEM sample extraction sites. Shape measurements for the CD probe tips used in the study were acquired both through the use of reentrant image reconstruction and independent (non-destructive) TEM micrographs of the probe tips. TEM images of the tips were acquired using a sample holder that provided the same projection of the tip as presented to the sample surface during AFM scanning. In order to provide meaningful validation of the CD AFM image reconstruction algorithm, widely varying sample morphologies and probe tip shapes were selected for the study. The results indicate a 1 - 2 nm bias between the TEM and CD AFM that is within the uncertainty of the measurements given the Line Width Variation (LWV) of the samples and accuracy of the measurement systems. Moreover, each TEM sample consisted of a grid with multiple features (i.e., 21 to 22 features). High density CD AFM pre-screening of the sample allowed precise locating of the TEM extraction site by correlating multiple feature profile shapes. In this way, the LWV and height of the sample were used to match measurement location for the two independent metrology systems.

原文English
主出版物標題Metrology, Inspection, and Process Control for Microlithography XXI
版本PART 1
DOIs
出版狀態Published - 2007 十月 15
事件Metrology, Inspection, and Process Control for Microlithography XXI - San Jose, CA, United States
持續時間: 2007 二月 262007 三月 1

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
號碼PART 1
6518
ISSN(列印)0277-786X

Other

OtherMetrology, Inspection, and Process Control for Microlithography XXI
國家United States
城市San Jose, CA
期間07-02-2607-03-01

    指紋

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

引用此

Dahlen, G. A., Mininni, L., Osborn, M., Liu, B. H., Osborne, J. R., Tracy, B., & Del Rosario, A. (2007). TEM validation of CD AFM image reconstruction. 於 Metrology, Inspection, and Process Control for Microlithography XXI (PART 1 編輯). [651818] (Proceedings of SPIE - The International Society for Optical Engineering; 卷 6518, 編號 PART 1). https://doi.org/10.1117/12.711943