TEM validation of CD AFM image reconstruction: Part II

Gregory A. Dahlen, Hao Chih Liu, Marc Osborn, Jason R. Osborne, Bryan Tracy, Amalia Del Rosario

研究成果: Conference contribution

8 引文 斯高帕斯(Scopus)

摘要

The present paper is a continuation of an investigation to validate CD AFM image reconstruction using Transmission Electron Microscopy (TEM) as the Reference Metrology System (RMS).1 In the present work, the validation of CD AFM with TEM is extended to include a 26 nm diameter carbon nanotube (CNT) tip for non-reentrant feature scans. The use of DT (deep trench) mode and a CNT tip provides detailed bottom feature resolution and close mid-CD agreement with both TEM and prior CD mode AFM scans (using a high resolution Trident tip). Averaging AFM scan lines within the ∼80 nm thickness region of the TEM sample2 is found to reduce systematic error with the RMS. Similarly, errors in alignment between AFM scan lines and TEM sample are corrected by a moving average method. Next, the NanoCD standard3 is used for complete 2D tip shape reconstruction (non-reentrant) utilizing its traceable feature width and well-defined upper-corner radius. The shape of the NanoCD is morphologically removed from the tip/standard image, thus providing the tip's shape with bounded dimensional uncertainty. Finally, an update of the measurement uncertainty budget for the current generation CD AFM is also presented, thus extending the prior work by NIST.4.

原文English
主出版物標題Metrology, Inspection, and Process Control for Microlithography XXII
DOIs
出版狀態Published - 2008
事件Metrology, Inspection, and Process Control for Microlithography XXII - San Jose, CA, United States
持續時間: 2008 2月 252008 2月 28

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6922
ISSN(列印)0277-786X

Other

OtherMetrology, Inspection, and Process Control for Microlithography XXII
國家/地區United States
城市San Jose, CA
期間08-02-2508-02-28

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

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