The doped quantum well FETs with Al0.5Ga0.5As/GaAs heterostructures have been fabricated using the low-pressure metalorganic chemical vapor deposition (LP-MOCVD) method. The conventional δ-doping thin layer in MODFET has been replaced with a doped Al0.5Ga0.5As/GaAs/Al0.5Ga0.5As quantum well. Doping level in the GaAs quantum well was varied to observe the effects on the 2-DEG density in the channel. The corresponding IDsat was increased from 12 mA to 27 mA at Vg=0 V for increasing the doping levelin the well.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)