The effect of electromagnetic retardation on the rupture process of a very thin liquid film

Chi Chuan Hwang, Te Chih Ke, Chaur Kie Lin, Chih Woei Shiau

研究成果: Article同行評審

摘要

Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a fiat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM).

原文English
頁(從 - 到)357-359
頁數3
期刊Journal of Colloid And Interface Science
219
發行號2
DOIs
出版狀態Published - 1999 11月 15

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 生物材料
  • 表面、塗料和薄膜
  • 膠體和表面化學

指紋

深入研究「The effect of electromagnetic retardation on the rupture process of a very thin liquid film」主題。共同形成了獨特的指紋。

引用此