@inproceedings{305e1c277c754ec6b4e7461a833f2f6d,
title = "The effects of annealing and Si content on the charge-discharge characteristics of Al-Si thin film with pre-deposited Al layer",
abstract = "In this study, radio frequency magnetron sputtering was used to prepare Al-Si film anodes and the effect of both pre-sputtered Al thin film and oxygen fraction(17 → 7 at. %) within the Al-Si film on the charge-discharge capacity characteristics are discussed. The pre-sputtered 40nm Al thin film not only reduced the resistivity of the composite anode film, but also diffused to prevent peeling between the Al-Si films and Cu foils after annealing in the vacuum. Owing to the above reasons, the stability for the charge-discharge cycling life at high temperature (55°C) was achieved. The reduction of oxygen fraction in the Al-Si film also led to an improvement on capacity of the anode.",
author = "Wu, {Chao Han} and Hung, {Fei Yi} and Lui, {Truan Sheng} and Chen, {Li Hui}",
year = "2011",
doi = "10.1002/9781118062111.ch13",
language = "English",
isbn = "9781118029459",
series = "TMS Annual Meeting",
publisher = "Minerals, Metals and Materials Society",
pages = "127--134",
booktitle = "Materials Processing and Energy Materials",
address = "United States",
}