The properties of Ti-doped ZnO films before and after annealing in the different atmosphere

Su Shia Lin, Jow Lay Huang

研究成果: Conference contribution

3 引文 斯高帕斯(Scopus)

摘要

A radio frequency power (r.f.) of 200W was supplied to ZnO target, and a direct current (d.c.) power of 30W was supplied to Ti target for the preparation of Ti-doped ZnO (ZnO:Ti) films. The Ti content was controlled by d.c. power, and maintained at 1.1 at.% as measured by XPS. The as-deposited ZnO:Ti films had polycrystalline structure and low resistivity (9.69×10 -3Ω-cm). After annealing in N2 or O2, ZnO:Ti films exhibited poor crystallinity, and the resistivity increased substantially. The lower optical energy gap (3.31 eV) could be obtained as ZnO:Ti film annealing in O2. However, the weak absorption in the visible region of the spectrum terminated at shorter wavelengths with the onset of the ultraviolet absorption edge for all samples. Annealing in N2 or O2 did not improve the properties of ZnO:Ti films.

原文English
主出版物標題Heat Treatment of Materials, AHTM ' 05 - Proceedings of the 3rd Asian Conference on Heat Treatment of Materials
發行者Trans Tech Publications Ltd
頁面571-576
頁數6
ISBN(列印)9783908451259
DOIs
出版狀態Published - 2006
事件3rd Asian Conference on Heat Treatment of Materials,(AHTM '05) - Gyeongju, Korea, Republic of
持續時間: 2005 11月 102005 11月 12

出版系列

名字Solid State Phenomena
118
ISSN(列印)1012-0394

Other

Other3rd Asian Conference on Heat Treatment of Materials,(AHTM '05)
國家/地區Korea, Republic of
城市Gyeongju
期間05-11-1005-11-12

All Science Journal Classification (ASJC) codes

  • 原子與分子物理與光學
  • 材料科學(全部)
  • 凝聚態物理學

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