The reliability analysis of GaN-based light-emitting diodes with different current-blocking layers

Y. Z. Chiou, T. H. Chiang, D. S. Kuo, S. J. Chang, T. K. Ko, S. J. Hon

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

摘要

This study employed Ar plasma treatment to selectively damage the p-GaN surface under the p-pad electrode as a current-blocking layer (CBL) on nitride-based light-emitting diodes (LEDs). Increasing the resistivity of the p-GaN region under the p-pad electrode can reduce the current flowing vertically downward from the p-pad electrode. At an injection current of 20 mA, the light output power of LEDs with Ar plasma treatment was 13% larger than that of conventional LEDs. At an injection current of 100 mA, the temperature of the p-pad metal on LEDs with Ar plasma treatment is 13 °C lower than that of the LEDs with a SiO2 CBL. However, the electrostatic discharge endurance of LEDs with Ar plasma treatment is the worst due to the surface damage of p-GaN under the p-pad electrode.

原文English
文章編號085005
期刊Semiconductor Science and Technology
26
發行號8
DOIs
出版狀態Published - 2011 8月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電氣與電子工程
  • 材料化學

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