The thermal stability of ohmic contact to n-type InGaAs layer

J. W. Wu, C. Y. Chang, K. C. Lin, E. Y. Chang, J. S. Chen, C. T. Lee

研究成果: Article同行評審

8 引文 斯高帕斯(Scopus)

摘要

The thermal stability of ohmic contact to n-type InGaAs layer is investigated. When Ni/Ge/Au is used as the contact metal, the characteristics of the ohmic contact are degraded after thermal treatment. The specific contact resistance of (Ni/Ge/Au)-InGaAs ohmic contact after annealing at 450°C is about 15 times larger than that of as-deposited sample. This is due to the decomposition of InGaAs and the interdiffusion of Ga and Au. A new phase of Au4ln appears after annealing at 300°C. While in the case of Ti/Pt/Au, Au does not penetrate into the InGaAs layer as revealed by secondary ion mass spectroscopy. The specific contact resistance of (Ti/Pt/Au)-InGaAs ohmic contact after annealing at 450°C is eight times larger than that of as-deposited sample. Therefore, the thermal stability of (Ti/Pt/Au)-InGaAs ohmic contact is better than that of (Ni/Ge/Au)InGaAs ohmic contact.

原文English
頁(從 - 到)79-82
頁數4
期刊Journal of Electronic Materials
24
發行號2
DOIs
出版狀態Published - 1995 二月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電氣與電子工程
  • 材料化學

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