Theoretical study of dislocation emission around a nanoindentation using a static atomistic model

Yeau Ren Jeng, Chung Ming Tan

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

摘要

This study uses an atomistic approach to simulate the emission of dislocations around a nanoindentation on a (001) copper surface. This approach is quasistatic, and is therefore computationally efficient. The simulation results illustrate the nucleation and emission of the dislocations. Slip vector analysis facilitates the observation of the dislocations and enables an interpretation of the dislocation reactions which are induced during the nanoindentation cycle. The results confirm that the von Mises shear stress is a good indicator of the atomic plastic behavior which occurs during the nanoindentation process.

原文English
期刊Physical Review B - Condensed Matter and Materials Physics
69
發行號10
DOIs
出版狀態Published - 2004 3月 24

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學

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