Thickness Effect of Nb-Doped TiO2 Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering

Zong Liang Tseng; Lung Chien Chen; Jian Fu Tang; Meng Fu Shih; Sheng Yuan Chu

doi:10.1007/s11664-016-5180-3

Thickness Effect of Nb-Doped TiO₂ Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering

Zong Liang Tseng, Lung Chien Chen, Jian Fu Tang, Meng Fu Shih, Sheng Yuan Chu

研究成果: Article › 同行評審

13 引文斯高帕斯（Scopus）

摘要

Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10⁻³ Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.

原文	English
頁（從 - 到）	1476-1480
頁數	5
期刊	Journal of Electronic Materials
卷	46
發行號	3
DOIs	https://doi.org/10.1007/s11664-016-5180-3
出版狀態	Published - 2017 3月 1

All Science Journal Classification (ASJC) codes

電子、光磁材料
凝聚態物理學
電氣與電子工程
材料化學

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10.1007/s11664-016-5180-3

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title = "Thickness Effect of Nb-Doped TiO2 Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering",

abstract = "Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10−3 Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.",

author = "Tseng, {Zong Liang} and Chen, {Lung Chien} and Tang, {Jian Fu} and Shih, {Meng Fu} and Chu, {Sheng Yuan}",

note = "Funding Information: This work was supported by the National Science Council of Taiwan from Grants NSC 100-2120-M-006-001 and ITRI 100C114. Publisher Copyright: {\textcopyright} 2016, The Minerals, Metals & Materials Society.",

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AU - Tang, Jian Fu

AU - Shih, Meng Fu

AU - Chu, Sheng Yuan

N1 - Funding Information: This work was supported by the National Science Council of Taiwan from Grants NSC 100-2120-M-006-001 and ITRI 100C114. Publisher Copyright: © 2016, The Minerals, Metals & Materials Society.

PY - 2017/3/1

Y1 - 2017/3/1

N2 - Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10−3 Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.

AB - Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10−3 Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.

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Thickness Effect of Nb-Doped TiO2 Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering

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Thickness Effect of Nb-Doped TiO₂ Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering