Thin film thickness and refractive index measurement by multiple beam interferometry

T. Y. Chen, Y. J. Lin, S. G. Hu, S. L. Yang, J. C. Chung

研究成果: Conference contribution

摘要

The materials will show remarkable different characteristics and phenomenon in the nano-scale. It has become unlackable to build and use precise measurement technologies and systems to understand and control the material characteristics. In this paper, a primary surface force apparatus to measure the thickness and refractive index of thin film is developed based on the multiple beam interferometriy. Using the symmetrical three-layer formula from Israelachvili, a software is designed to analyze the Fringe of Equal Chromatic Order (FECO) produced from multiple beam interferometry. Test of the system on the the experimental FECO is shown. The applicability of the system is validated. Further discussion of the factors that affect the formation of FECO is given.

原文English
主出版物標題Fourth International Conference on Experimental Mechanics
DOIs
出版狀態Published - 2010
事件4th International Conference on Experimental Mechanics - Singapore, Singapore
持續時間: 2009 11月 182009 11月 20

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7522
ISSN(列印)0277-786X

Other

Other4th International Conference on Experimental Mechanics
國家/地區Singapore
城市Singapore
期間09-11-1809-11-20

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

指紋

深入研究「Thin film thickness and refractive index measurement by multiple beam interferometry」主題。共同形成了獨特的指紋。

引用此