Thin film thickness and refractive index measurement by multiple beam interferometry and fast spectral correlation method

Terry Yuan Fang Chen, Chien Chih Chen

研究成果: Conference contribution

摘要

The establishment and use of precision measurement technology and system become an important part to understand and to effectively control the materials, structures or installations in nano-scale. In this paper, a system based on the multiple beam interferometry, multi-matrix method and fast spectral correlation method is developed to measure the thickness and refractive index of thin film. Primary study to analyze the FECO images obtained from symmetrical three-layer (mica-air-mica) with film thickness over 200nm and non-symmetrical interference (mica- air- LDPE-mica) was made. The results show that the fast spectral correlation formula can be applied to both symmetric and non-symmetric three-layer interference, and the film thickness measurement is applicable to over 200nm.

原文English
主出版物標題Sixth International Symposium on Precision Engineering Measurements and Instrumentation
DOIs
出版狀態Published - 2010 十二月 1
事件6th International Symposium on Precision Engineering Measurements and Instrumentation - Hangzhou, China
持續時間: 2010 八月 82010 八月 11

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
7544
ISSN(列印)0277-786X

Other

Other6th International Symposium on Precision Engineering Measurements and Instrumentation
國家/地區China
城市Hangzhou
期間10-08-0810-08-11

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

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