摘要
The authors report the deposition of amorphous indium-gallium-oxide (a-IGO) films on glass substrate by co-sputtering and the fabrication of thin film transistors (TFTs) with a-IGO bilayer channel. It was found that the electron mobility, μFE, sub-threshold swing, SS, and Ion/Ioff ratio of the fabricated TFTs were all better than those reported previously from the TFTs with single a-IGO channel. By properly controlling the sputtering powers, we achieved TFTs with μFE of 53.2 cm 2/Vs, SS of 0.19 V/decade and Ion/Ioff ratio of 107.
原文 | English |
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文章編號 | 7884959 |
頁(從 - 到) | 572-575 |
頁數 | 4 |
期刊 | IEEE Electron Device Letters |
卷 | 38 |
發行號 | 5 |
DOIs | |
出版狀態 | Published - 2017 5月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 電氣與電子工程